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The Quantix test bench

Monday, Oct 12, 2020

The Quantix test bench is a cryostat designed to measure quantum efficiency. The quantum efficiency is the ratio of the photonic current measured by the detector (in e-/s/pixel) to the photon flux (in photons/s/pixel) emitted by a light source and received by the detector. Typical values are above 70% for near infrared devices. The light source is a monochromator (outside the cryostat) which delivers a monochromatic light of typically 20 nm bandpass.

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The Verticalix test bench

Monday, Oct 12, 2020

The Verticalix test bench is a cryostat designed to measure very low dark currents. The dark current is the current that is thermally generated inside a semi-conductor detector in the absence of light, and is therefore strongly dependent on the temperature of the detector. Opposite to standard cryostats, Verticalix has no entrance window to let light entering the cryostat. Moreover, the inside of the cryostat is very cold: the environment of the detectors inside their housing is typically around 10 K, corresponding to a level of thermal radiation so small that it cannot be detected in the wavelength range of interest to ASTEROID (near infrared up to 2.

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First batch of 2k2 detectors developed

Friday, Jun 28, 2019

First batch of 4 2k2 detectors at 15 µm pitch, fabricated on 4’’ substrates at LETI. The 4’’ substrates makes it possible to fabricate 4 detectors at a time, with substantial economy of scale as compared to standard 3’’ substrates.

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Proposed bi-layer process to further improve proximity exposure performance for lift-off processes

Monday, Nov 19, 2018

In order to overcome discovered pattern resolution limitations using proximity lithography with the predefined Asteroid process materials (negative tone resist, bright field mask layout), EVG developed and studied an alternative bi-layer process approach for the desired lift-off application and the fine pitch structure of the Asteroid ROIC. The bi-layer resist concept is based on switching the lithography exposure mask polarity to darkfield and using positive tone resist as the top resist layer.

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